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Home - ARCNL
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Advanced Research Center for Nanolithography (ARCNL) is a fundamental research institute with relevance to key technologies in nanolithography.
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Home - ARCNL Logo Mission Research Source department EUV Plasma Processes Oscar Versolato Plasma Theory and Modeling John Sheil Ion Interactions Ronnie Hoekstra Metrology department EUV Generation & Imaging Stefan Witte Kjeld Eikema Light-Matter Interaction Paul Planken Computational Imaging Arie den Boef High-Harmonic Generation and EUV Science Peter Kraus Nanoscale Imaging and Metrology Lyuba Amitonova Materials department Contact Dynamics Bart Weber Materials & Surface Science for EUVL Roland Bliem Materials Theory and Modeling Emilia Olsson Career Career All vacancies Postdoc vacancies PhD vacancies Scientific internships Support vacancies How to apply Coming from abroad More More People News Events Repository Contact & Directions Newsletter Directory menu Search Advanced Research Center for Nanolithography 2024 marks ARCNL’s 10 th anniversary: a decade of fundamental and excelle...
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